JPS56132345A - Developer composition for lithographic plate - Google Patents
Developer composition for lithographic plateInfo
- Publication number
- JPS56132345A JPS56132345A JP3587180A JP3587180A JPS56132345A JP S56132345 A JPS56132345 A JP S56132345A JP 3587180 A JP3587180 A JP 3587180A JP 3587180 A JP3587180 A JP 3587180A JP S56132345 A JPS56132345 A JP S56132345A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- developer
- acids
- lithographic plate
- 5w90wt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 abstract 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- 150000007513 acids Chemical class 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 abstract 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 abstract 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 abstract 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract 2
- AAFXQFIGKBLKMC-KQQUZDAGSA-N (e)-3-[4-[(e)-2-carboxyethenyl]phenyl]prop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=C(\C=C\C(O)=O)C=C1 AAFXQFIGKBLKMC-KQQUZDAGSA-N 0.000 abstract 1
- HAEJSGLKJYIYTB-ZZXKWVIFSA-N 4-carboxycinnamic acid Chemical compound OC(=O)\C=C\C1=CC=C(C(O)=O)C=C1 HAEJSGLKJYIYTB-ZZXKWVIFSA-N 0.000 abstract 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 abstract 1
- 239000001361 adipic acid Substances 0.000 abstract 1
- 235000011037 adipic acid Nutrition 0.000 abstract 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract 1
- 239000004310 lactic acid Substances 0.000 abstract 1
- 235000014655 lactic acid Nutrition 0.000 abstract 1
- 230000007774 longterm Effects 0.000 abstract 1
- 239000011707 mineral Substances 0.000 abstract 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 abstract 1
- 229920005862 polyol Polymers 0.000 abstract 1
- 150000003077 polyols Chemical class 0.000 abstract 1
- 239000001384 succinic acid Substances 0.000 abstract 1
- 150000003460 sulfonic acids Chemical class 0.000 abstract 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3587180A JPS56132345A (en) | 1980-03-21 | 1980-03-21 | Developer composition for lithographic plate |
| EP81300913A EP0037179B1 (en) | 1980-03-21 | 1981-03-04 | Developer composition for lithographic printing plates, a method of plate development, and developed plates |
| DE8181300913T DE3170683D1 (en) | 1980-03-21 | 1981-03-04 | Developer composition for lithographic printing plates, a method of plate development, and developed plates |
| AU68522/81A AU538805B2 (en) | 1980-03-21 | 1981-03-18 | Litho developer |
| CA000373545A CA1160882A (en) | 1980-03-21 | 1981-03-20 | Developer composition for lithographic plates including tetrahydrofurfuryl alcohol |
| US06/439,876 US4863835A (en) | 1980-03-21 | 1982-11-08 | Developer composition for lithographic printing plates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3587180A JPS56132345A (en) | 1980-03-21 | 1980-03-21 | Developer composition for lithographic plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56132345A true JPS56132345A (en) | 1981-10-16 |
| JPS6113218B2 JPS6113218B2 (en]) | 1986-04-12 |
Family
ID=12454050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3587180A Granted JPS56132345A (en) | 1980-03-21 | 1980-03-21 | Developer composition for lithographic plate |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4863835A (en]) |
| EP (1) | EP0037179B1 (en]) |
| JP (1) | JPS56132345A (en]) |
| AU (1) | AU538805B2 (en]) |
| CA (1) | CA1160882A (en]) |
| DE (1) | DE3170683D1 (en]) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5178989A (en) * | 1989-07-21 | 1993-01-12 | Board Of Regents, The University Of Texas System | Pattern forming and transferring processes |
| US5268260A (en) * | 1991-10-22 | 1993-12-07 | International Business Machines Corporation | Photoresist develop and strip solvent compositions and method for their use |
| US5962192A (en) * | 1996-06-19 | 1999-10-05 | Printing Developments, Inc. | Photoresists and method for making printing plates |
| DE69841948D1 (de) * | 1997-08-08 | 2010-11-25 | Dainippon Printing Co Ltd | Lithographieplatte und Verfahren zu derer Herstellung |
| US20100129756A1 (en) * | 2007-05-15 | 2010-05-27 | Willi-Kurt Gries | Gum solution for developing and gumming a photopolymer printing plate |
| KR20120117733A (ko) * | 2010-01-25 | 2012-10-24 | 도아고세이가부시키가이샤 | 도전성 고분자를 포함하는 기재 상의 포토레지스트용 현상액, 및 패턴 형성 방법 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1102952A (en) * | 1963-09-05 | 1968-02-14 | Howson Ltd W H | Processing of presensitized photolithographic printing plates |
| GB1168445A (en) * | 1966-05-26 | 1969-10-22 | Howson Ltd W H | Improvements in or relating to Presensitised Printing Plates |
| GB1220808A (en) * | 1967-05-18 | 1971-01-27 | Howson Algraphy Ltd | Processing of presensitized photolithographic printing plate |
| US3929489A (en) * | 1973-09-14 | 1975-12-30 | Eastman Kodak Co | Lithographic plates having radiation sensitive elements developable with aqueous alcohol |
| JPS50108005A (en]) * | 1974-01-31 | 1975-08-26 | ||
| JPS583538B2 (ja) * | 1974-12-26 | 1983-01-21 | 三菱化学株式会社 | ケイヒサンケイカンコウセイジユシヨウゲンゾウエキ |
| FR2340052A1 (fr) * | 1976-02-04 | 1977-09-02 | Nestle Sa Soc Ass Tech Prod | Procede de fabrication de fromages |
| JPS5344202A (en) * | 1976-10-01 | 1978-04-20 | Fuji Photo Film Co Ltd | Developer composition and developing method |
| US4139390A (en) * | 1977-02-10 | 1979-02-13 | Eastman Kodak Company | Presensitized printing plate having a print-out image |
| JPS5540415A (en) * | 1978-09-14 | 1980-03-21 | Mitsubishi Chem Ind Ltd | Photosensitive composition |
| JPS5555335A (en) * | 1978-10-19 | 1980-04-23 | Fuji Photo Film Co Ltd | Photosensitive composition |
-
1980
- 1980-03-21 JP JP3587180A patent/JPS56132345A/ja active Granted
-
1981
- 1981-03-04 EP EP81300913A patent/EP0037179B1/en not_active Expired
- 1981-03-04 DE DE8181300913T patent/DE3170683D1/de not_active Expired
- 1981-03-18 AU AU68522/81A patent/AU538805B2/en not_active Ceased
- 1981-03-20 CA CA000373545A patent/CA1160882A/en not_active Expired
-
1982
- 1982-11-08 US US06/439,876 patent/US4863835A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| AU6852281A (en) | 1981-09-24 |
| EP0037179B1 (en) | 1985-05-29 |
| CA1160882A (en) | 1984-01-24 |
| JPS6113218B2 (en]) | 1986-04-12 |
| US4863835A (en) | 1989-09-05 |
| AU538805B2 (en) | 1984-08-30 |
| DE3170683D1 (en) | 1985-07-04 |
| EP0037179A3 (en) | 1982-06-30 |
| EP0037179A2 (en) | 1981-10-07 |
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